MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded 15 300mm鏡面研磨単結晶シリコンウェーハ（ノッチ付き，T/4 エッジプロファイル）

15 300mm鏡面研磨単結晶シリコンウェーハ（ノッチ付き，T/4 エッジプロファイル）

then defining MPCT performance as a function of IPS performance

The purpose of this Test Method is to define a method for determining numerical values for surface roughness parameters measured on gas distribution system components

SEMI M1-1117 (technical revision)

1-0704 - イベントレポートスタンダードへのSECS-Ⅱ のサポート

MS00200 - SEMI MS2 - Test Method for Step Height Measurements of Thin Films Revision:SEMI MS2-1109 - Superseded 15 300mm鏡面研磨単結晶シリコンウェーハ（ノッチ付き，T/4 エッジプロファイル）1 Purpose 1. 1 This Test Method enables the determination of step height measurements of thin films. Step height measurements can be used to determine thin film thickness values. Thickness measurements are an aid in the design and fabrication of MEMS devices and can be used to obtain thin film material parameters, such as Youngs modulus. 2 Scope 2. 1 This Test Method presents a procedure for measuring step heights of thin films using step height test