M00600 - SEMI M6 - 太陽光電池用シリコンウェーハの仕様 Revision:SEMI M6-1108 - Superseded Optical measurement methods are widely

Optical measurement methods are widely used to evaluate flatness of substrate

test methods

Its value is dependent on the work function difference between the silicon and the metal field plate

FPD製造で用いられる偏光板に適用するものとする。その範囲は，材料・検査・測定で使用される，偏光板関連用語である。

and for determining the temperature of the specimen during the measurement are also given

M00600 - SEMI M6 - 太陽光電池用シリコンウェーハの仕様 Revision:SEMI M6-1108 - Superseded Optical measurement methods are widelyglobal Silicon Wafer Committee2008829global Audits and Reviews Subcommittee200810www. semi. org200811CD ROM198120077 SEMI M6SEMI M6. 1SEMI M6. 2SEMI M6. 3SEMI M6. 4SEMI M6. 5 PV Referenced SEMI Standards SEMI M1 Specifications for Polished Monocrystalline Silicon Wafers SEMI M59 Terminology for Silicon Technology SEMI MF26 Test Methods for Determining the Orientation of a Semiconductive Single Crystal