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Climate FRESK Workshop StdTier-Tier1 It facilitates selection of customer-driven

$2500.00

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It facilitates selection of customer-driven parameters for 300 mm wafers with the Si film thickness from 8 to 300 nm

This Test Method covers determination of the effective work function of both oxide and high-κ gate stacks

This Document specifies the classes that suppliers are to use to describe essential data

org in July 2008

The reproducibility of spreading resistance measurements on silicon specimens is known to depend on the manner of specimen preparation

Climate FRESK Workshop StdTier-Tier1 It facilitates selection of customer-driven

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